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The main attempt of silanization is to form bonds across the interface between mineral/inorganic components and organic components present in paints, adhesives etc., or as the anchor for further steps of surface modifications.
This step proved to be difficult to measure with conventional methods. As for imaging ellipsometry, it provides the sensitivity to investigate e.g. the formation of bonds in a structured array for the use in micro-arrays without the need of an additional fluorescence marker, making it an exceptional device.
Surface Engineering Detection of atmospheric pressure plasma-induced removal of fingerprints via analysis of histograms obtained by imaging ellipsometry (2021)
Surface Engineering Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon (2021)
Surface Engineering Spectroscopic Imaging Ellipsometry of Self-Assembled SiGe/Si Nanostructures (2017)