2D-Materials | Park Systems GmbH

Graphene on SiO2/Si

2D material on glass

2D microcrystallite with monolayer

Hetero-Structure MoS2/WSe2

Flake search for mono- and trilayer

What is unique about an imaging ellipsometer?

Spectroscopic ellipsometric measurements on flakes of 2D-materials with sizes down to 1µm
Microscopic maps of thickness distribution and refractive indices from 190-1700nm
Ellipsometric contrast micrographs (ECM) enable increased contrast imaging over e.g. optical microscopy to visualize layer numbers and inhomogeneities
Non-destructive measurements on transparent substrates using knife edge illumination to prevent unwanted backside reflections

Advantages of imaging ellipsometry over other techniques

Imaging spectroscopic ellipsometry can be applied to characterize graphene and other 2D-materials. CVD grown, exfoliated and epitaxially grown flakes of 2D-materials are analyzed with the imaging ellipsometer ep4.

Imaging of monolayers on different substrates
Determination of the optical dispersion
Distinction between mono-, bi- or n-layers
Automatic flakesearch algorithm for identification of monolayers or well-defined thickness regions
Exploration of heterostructures
Quality control by detecting defects and special aspects of 2D nanoplates